High-resolution Micropatterning of Off-stochiometric Thiol-enes (oste) via a Novel Lithography Mechanism
نویسندگان
چکیده
We present an entirely novel, self-limiting photolithography mechanism in off-stoichiometry thiol-ene (OSTE) polymers enabling high-resolution and high-aspect ratio features. The OSTE polymers have previously been shown to be promising materials for fabrication of microfluidic devices with tailored surface modifications and mechanical properties. We here introduce direct lithography for micropatterning of OSTE as an alternative to mechanical machining or casting, resulting in a simple and reliable fabrication method of self-bonding photopatterned multilayer microfluidic devices.
منابع مشابه
Beyond PDMS: off-stoichiometry thiol-ene (OSTE) based soft lithography for rapid prototyping of microfluidic devices.
In this article we introduce a novel polymer platform based on off-stoichiometry thiol-enes (OSTEs), aiming to bridge the gap between research prototyping and commercial production of microfluidic devices. The polymers are based on the versatile UV-curable thiol-ene chemistry but takes advantage of off-stoichiometry ratios to enable important features for a prototyping system, such as one-step ...
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